A method of forming a feature on a device is disclosed. A photo resist layer is formed over the device and a dipole illuminator having a pole orientation axis in a first direction is used to expose a first geometrical pattern onto the resist layer. The first geometrical pattern is substantially oriented...http://www.google.fr/patents/US7799517?utm_source=gb-gplus-shareBrevet US7799517 - Single/double dipole mask for contact holes
