An optical measurement system is disclosed for evaluating samples with multi-layer thin film stacks. The optical measurement system includes a reference ellipsometer and one or more non-contact optical measurement devices. The reference ellipsometer is used to calibrate the other optical measurement...http://www.google.fr/patents/US6774997?utm_source=gb-gplus-shareBrevet US6774997 - Apparatus for analyzing multi-layer thin film stacks on semiconductors
Apparatus for analyzing multi-layer thin film stacks on semiconductors
