A dressing apparatus is used to resurface a polishing surface of a polish cloth used to polish semiconductor wafers. A dressing brush which spins on its own axis is also coupled to a drive shaft of a main drive of the dressing apparatus through a planetary gear mechanism so that the brush will rotate...http://www.google.fr/patents/US5643067?utm_source=gb-gplus-shareBrevet US5643067 - Dressing apparatus and method
