The invention relates to a semiconductor exposing system for projecting a pattern of a mask onto a semiconductor wafer and, more particularly, to such a system having an apparatus for correcting an influence on the resolution by a fluctuation in wavelength of a laser light source. The system of the invention...http://www.google.fr/patents/US4922290?utm_source=gb-gplus-shareBrevet US4922290 - Semiconductor exposing system having apparatus for correcting change in wavelength of light source
Semiconductor exposing system having apparatus for correcting change in ...
