Photoresist baked upon integrated circuit wafers is mechanically stripped therefrom. Wafers are unloaded from boats at the top of an elevator within a vertical housing filled with stripper solution, then deposited on a conveyor and carried through a horizontal housing also filled with stripper. The wafers...http://www.google.fr/patents/US4722355?utm_source=gb-gplus-shareBrevet US4722355 - Machine and method for stripping photoresist from wafers
Machine and method for stripping photoresist from wafers
