A novel method of pattern formation and a projection exposure apparatus are disclosed, in which the pupil of a projection lens of the projection exposure apparatus used for forming an LSI pattern or the like has mounted thereon an optical filter having a complex amplitude transmittance distribution expressed...http://www.google.fr/patents/US5595857?utm_source=gb-gplus-shareBrevet US5595857 - Method of forming a pattern and projection exposure apparatus
Method of forming a pattern and projection exposure apparatus
