A process for selectively depositing platinum on a conductive or semiconductive substrate has the steps of: patterning a polyimide layer on the substrate to have exposed areas and unexposed areas; and, at an operating temperature and an operating pressure, flowing a platinum precursor gas over the s...http://www.google.fr/patents/US5320978?utm_source=gb-gplus-shareBrevet US5320978 - Selective area platinum film deposition
