A heat-treating apparatus is arranged to perform a reforming process and a crystallizing process for tantalum oxide deposited on a semiconductor wafer. The apparatus includes a worktable with a heater incorporated therein. Under the worktable, there is a heat-compensating member formed of a thin plate...http://www.google.fr/patents/US6228173?utm_source=gb-gplus-shareBrevet US6228173 - Single-substrate-heat-treating apparatus for semiconductor process system
Single-substrate-heat-treating apparatus for semiconductor process system
