The methods and apparatus 300 disclosed herein concern Raman spectroscopy using metal coated nanocrystalline porous silicon substrates 240, 340. In certain embodiments of the invention, porous silicon substrates 110, 210 may be formed by anodic etching in dilute hydrofluoric acid 150. A thin coating...http://www.google.fr/patents/US20030231304?utm_source=gb-gplus-shareBrevet US20030231304 - Metal coated nanocrystalline silicon as an active surface enhanced raman spectroscopy (SERS) substrate
Metal coated nanocrystalline silicon as an active surface enhanced raman ...
Numéro de demande: 10/171,357 Numéro de publication: US 2003/0231304 A1 Date de dépôt: 12 juin 2002 Brevet délivré: US6970239 ( Date de délivrance 29 nov. 2005)
