A plasma reactor for processing a semiconductor wafer includes a side wall and an overhead ceiling defining a chamber, a workpiece support cathode within the chamber having a working surface facing the ceiling for supporting a semiconductor workpiece, process gas inlets for introducing a process gas...http://www.google.fr/patents/US6900596?utm_source=gb-gplus-shareBrevet US6900596 - Capacitively coupled plasma reactor with uniform radial distribution of plasma
Capacitively coupled plasma reactor with uniform radial distribution of plasma
