A semiconductor substrate processing system and method of using a stable heating source with a large thermal mass relative to conventional lamp heating systems. The system dimensions and processing parameters are selected to provide a substantial heat flux to the substrate while reducing the potential...http://www.google.fr/patents/US6342691?utm_source=gb-gplus-shareBrevet US6342691 - Apparatus and method for thermal processing of semiconductor substrates
Apparatus and method for thermal processing of semiconductor substrates
