A method of manufacturing a semiconductor device for patterning a semiconductor substrate by photolithography, the semiconductor substrate having a transparent or semitransparent layer having a high transmissivity at an exposure wavelength .lambda., and the transparent or semitransparent layer being...http://www.google.fr/patents/US5985519?utm_source=gb-gplus-shareBrevet US5985519 - Method of manufacturing semiconductor device using top antireflection film
Method of manufacturing semiconductor device using top antireflection film
