A dielectric layer containing an atomic layer deposited insulating metal oxide film having multiple metal components and a method of fabricating such a dielectric layer produce a reliable dielectric layer for use in a variety of electronic devices. Embodiments include conducting a number of annealing...http://www.google.fr/patents/US7588988?utm_source=gb-gplus-shareBrevet US7588988 - Method of forming apparatus having oxide films formed using atomic layer deposition
Method of forming apparatus having oxide films formed using atomic layer ...
