A method and system for removing volatile residues from a substrate are provided. In one embodiment, the volatile residues removal process is performed en-routed in the system while performing a halogen treatment process on the substrate. The volatile residues removal process is performed in the system...http://www.google.fr/patents/US20080099040?utm_source=gb-gplus-shareBrevet US20080099040 - INTEGRATED METHOD FOR REMOVAL OF HALOGEN RESIDUES FROM ETCHED SUBSTRATES IN A PROCESSING SYSTEM
INTEGRATED METHOD FOR REMOVAL OF HALOGEN RESIDUES FROM ETCHED SUBSTRATES IN ...
Numéro de demande: 11/676,161 Numéro de publication: US 2008/0099040 A1 Date de dépôt: 16 févr. 2007 Brevet délivré: US7846845 ( Date de délivrance 7 déc. 2010)
