The invention provides a reduced complexity layout style based on applying a limited set of changes to an underlying repeated base template. With the templates properly defined in accordance with the characteristic features disclosed, the invention enables efficient implementation of logic circuitry,...http://www.google.fr/patents/US8004315?utm_source=gb-gplus-shareBrevet US8004315 - Process for making and designing an IC with pattern controlled layout regions
Process for making and designing an IC with pattern controlled layout regions
