A CVD precursor that is a precursor in film preparation by the CVD method, comprising a metalorganic compound containing a metal element constituting the film (called "main compound") having blended therewith another organic compound, the other organic compound having a lower vapor pressure than the...http://www.google.fr/patents/US5952047?utm_source=gb-gplus-shareBrevet US5952047 - CVD precursors and film preparation method using the same
CVD precursors and film preparation method using the same
