A method for dry etching and chamber cleaning high dielectric constant materials is disclosed herein. In one aspect of the present invention, there is provided a process for cleaning a substance comprising a dielectric constant greater than the dielectric constant of silicon dioxide from at least a portion...http://www.google.fr/patents/US7055263?utm_source=gb-gplus-shareBrevet US7055263 - Method for cleaning deposition chambers for high dielectric constant materials
Method for cleaning deposition chambers for high dielectric constant materials
