A method of improving plasma processing of a semiconductor wafer by exposing the wafer or the plasma to photons while the wafer is being processed. One embodiment of the method comprises the steps of etching an aluminum layer and, during the etching, exposing the semiconductor wafer containing the aluminum...http://www.google.fr/patents/US6569775?utm_source=gb-gplus-shareBrevet US6569775 - Method for enhancing plasma processing performance
Method for enhancing plasma processing performance
