A photomask for integrated circuit production comprising a substrate, one or more layers and a detector for monitoring a process parameter of the integrated circuit production in combination with one or more of the following: communication circuitry for communicating with external equipment for the integrated...http://www.google.fr/patents/US7790340?utm_source=gb-gplus-shareBrevet US7790340 - Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same
Photomask with detector for optimizing an integrated circuit production ...
