The present invention provides a patterning process, in which a resistance with regard to an organic solvent used for a composition for formation of a reverse film is rendered to a positive pattern to the degree of necessity and yet solubility into an alkaline etching liquid is secured, thereby enabling...http://www.google.fr/patents/US8198016?utm_source=gb-gplus-shareBrevet US8198016 - Patterning process
