A method for fabricating a thin film semiconductor device includes the steps of introducing, into an amorphous film of a semiconductor material, at least one metallic element that forms an intermetallic compound with the semiconductor material and at least one nonmetallic element selected from...http://www.google.fr/patents/US5804473?utm_source=gb-gplus-shareBrevet US5804473 - Thin film semiconductor device having a polycrystal active region and a fabrication process thereof
Thin film semiconductor device having a polycrystal active region and a ...
