A method for fabricating a semiconductor device comprises patterning a layer of photoresist material to form a plurality of mandrels in a device array region. The method further comprises depositing an oxide material over the plurality of mandrels and over a device peripheral region. The method further...http://www.google.fr/patents/US7902074?utm_source=gb-gplus-shareBrevet US7902074 - Simplified pitch doubling process flow
