This invention relates to an Ilumination system for scanning lithography especially for wavelengths≦193 nm, particularly EUV lithography, for the illumination of a slit, comprising at least one field mirror or at least one field lens and being characterized in that at least one of the field mirror(s)...http://www.google.fr/patents/US7126137?utm_source=gb-gplus-shareBrevet US7126137 - Illumination system with field mirrors for producing uniform scanning energy
Illumination system with field mirrors for producing uniform scanning energy
