A supercritical etching composition and method for etching an inorganic material of a semiconductor-based substrate are provided. The method includes providing a semiconductor-based substrate having an exposed inorganic material and exposing the substrate to the supercritical etching composition, whereby...http://www.google.fr/patents/US6149828?utm_source=gb-gplus-shareBrevet US6149828 - Supercritical etching compositions and method of using same
Supercritical etching compositions and method of using same
