A method for forming a top magnetic pole of an inductive magnetic head being begins with the step of forming a photolithographic material over a layer of insulating material at a hill region and gap region of the inductive magnetic head formed on a wafer and over a waste region of the wafer. Second,...http://www.google.fr/patents/US6381833?utm_source=gb-gplus-shareBrevet US6381833 - Method for making narrow top poles for inductive magnetic heads
Method for making narrow top poles for inductive magnetic heads
