There is disclosed a method of producing a phase shift mask blank wherein the method includes at least a step of forming one or more layers of phase shift films on a substrate by a sputtering method, and in the step, the phase shift films are formed by the sputtering method while simultaneously discharging...http://www.google.fr/patents/US7344806?utm_source=gb-gplus-shareBrevet US7344806 - Method of producing phase shift mask blank, method of producing phase shift mask, phase shift mask blank, and phase shift mask
Method of producing phase shift mask blank, method of producing phase shift ...
