A method of forming low dielectric contrast structures by imprinting a silsesquioxane based polymerizable composition. The imprinting composition including: one or more polyhedral silsesquioxane oligomers each having one or more polymerizable groups, wherein each of the one or more polymerizable group...http://www.google.fr/patents/US20080166871?utm_source=gb-gplus-shareBrevet US20080166871 - POLYHEDRAL OLIGOMERIC SILSESQUIOXANE BASED IMPRINT MATERIALS AND IMPRINT PROCESS USING POLYHEDRAL OLIGOMERIC SILSESQUIOXANE BASED IMPRINT MATERIALS
POLYHEDRAL OLIGOMERIC SILSESQUIOXANE BASED IMPRINT MATERIALS AND IMPRINT ...
Numéro de demande: 12/053,893 Numéro de publication: US 2008/0166871 A1 Date de dépôt: 24 mars 2008 Brevet délivré: US8026293 ( Date de délivrance 27 sept. 2011)
