The present invention features a system to determine relative spatial parameters between two coordinate systems, which may be a mold and a region of a substrate in which mold is employed to generate a pattern. The system senses relative alignment between the two coordinate systems at multiple points...http://www.google.fr/patents/US7292326?utm_source=gb-gplus-shareBrevet US7292326 - Interferometric analysis for the manufacture of nano-scale devices
Interferometric analysis for the manufacture of nano-scale devices
