Fixed amounts of a liquid source for a chemical vapor deposition process is supplied continuously from a source tank and through a liquid mass flow controller to a three-way valve. Inside the three-way valve, the liquid source is evaporated to generate a source gas by contacting a high-temperature carrier...http://www.google.fr/patents/US5419924?utm_source=gb-gplus-shareBrevet US5419924 - Chemical vapor deposition method and apparatus therefore
Chemical vapor deposition method and apparatus therefore
