Embodiments of the present invention relate to methods for depositing an amorphous film that may be suitable for using in a NIP photodiode in display applications. In one embodiment, the method includes providing a substrate into a deposition chamber, supplying a gas mixture having a hydrogen gas to...http://www.google.fr/patents/US7955890?utm_source=gb-gplus-shareBrevet US7955890 - Methods for forming an amorphous silicon film in display devices
Methods for forming an amorphous silicon film in display devices
