In a method of effectively miniaturizing a resist pattern, a super fine pattern-forming method of restricting a film thickness of a crosslinked film and also preventing developing defects is provided using a super fine pattern-forming material which contains a solvent composed of a water-soluble resin,...http://www.google.fr/patents/US7592132?utm_source=gb-gplus-shareBrevet US7592132 - Method for fine pattern formation
