A method of and apparatus removes foreign particles in a vacuum or in a dry atmosphere before and in continuation to performing a dry process, such as a dry etching or a sputtering process. For this purpose, the foreign particles are separated from a substrate by subjecting the foreign particles to a...http://www.google.fr/patents/US5531862?utm_source=gb-gplus-shareBrevet US5531862 - Method of and apparatus for removing foreign particles
Method of and apparatus for removing foreign particles
