A metallurgic implantation apparatus of metal ions having a large emitting surface, a considerable flux and a controllable implantation depth comprises within an implantation chamber held in vacuo at least one vacuum arc ion source (1, 2, 3, 4) from which the ions (5) are extracted and projected onto...http://www.google.fr/patents/US4994164?utm_source=gb-gplus-shareBrevet US4994164 - Metal ion implantation apparatus
