The invention is intended to provide a sputtering device in which a single sputtering chamber is equipped with a plurality of supports and a target-positioning mechanism for rotating the supports to position the targets into film-forming position. Each support is provided with targets that are different...http://www.google.fr/patents/US20030085122?utm_source=gb-gplus-shareBrevet US20030085122 - Sputtering device
Numéro de demande: 10/280,035 Numéro de publication: US 2003/0085122 A1 Date de dépôt: 25 oct. 2002 Brevet délivré: US6800183 ( Date de délivrance 5 oct. 2004)
