In the fabrication of semiconductor devices such as active matrix displays, the need to pattern resist masks in photolithography increases the number of steps in the fabrication process and the time required to complete them and consequently represents a substantial cost. This invention provides a method...http://www.google.fr/patents/US20020006705?utm_source=gb-gplus-shareBrevet US20020006705 - Semiconductor device and method for manufacturing same
Semiconductor device and method for manufacturing same
Numéro de demande: 09/852,282 Numéro de publication: US 2002/0006705 A1 Date de dépôt: 10 mai 2001 Brevet délivré: US6773996 ( Date de délivrance 10 août 2004)
