A pattern defect inspection apparatus capable of detecting defects without being affected by non-uniform thickness of a thin film formed on a sample even when using monochromatic light such as a laser. The apparatus comprises a laser to illuminate a sample, coherence suppression optics to reduce laser...http://www.google.fr/patents/US20030210391?utm_source=gb-gplus-shareBrevet US20030210391 - Method and apparatus for inspecting pattern defects
Method and apparatus for inspecting pattern defects
Numéro de demande: 10/223,422 Numéro de publication: US 2003/0210391 A1 Date de dépôt: 20 août 2002 Brevet délivré: US7218389 ( Date de délivrance 15 mai 2007)
