The present invention provides a method for forming a barrier layer, preferably a conductive barrier layer. According to the present invention, a barrier layer is formed from an organometallic precursor in the presence of an oxidant in a low temperature deposition technique using a platinum containing...http://www.google.fr/patents/US6204172?utm_source=gb-gplus-shareBrevet US6204172 - Low temperature deposition of barrier layers
