A gas distribution ceiling electrode for use as a capacitive source power applicator and gas distribution showerhead in a plasma reactor includes a metal base and a process-compatible protective layer on the interior surface of he electrode having a dopant impurity concentration within a range corresponding...http://www.google.fr/patents/US7220937?utm_source=gb-gplus-shareBrevet US7220937 - Plasma reactor with overhead RF source power electrode with low loss, low arcing tendency and low contamination
Plasma reactor with overhead RF source power electrode with low loss, low ...
