By using a reflection mask for reflective reduction projection exposure which uses vacuum ultraviolet rays or soft X-rays of wavelength .lambda., there is enhancement of the resolution of the projection exposure by making the height of adjacent or neighboring reflective surfaces to be deviated by about...http://www.google.fr/patents/US5328784?utm_source=gb-gplus-shareBrevet US5328784 - Reflection mask, method of producing mask and method of forming pattern using the mask
Reflection mask, method of producing mask and method of forming pattern ...
