The invention provides an impedance matching and power control system not resorting to mechanical control for a device for high frequency plasma treatment. An impedance matching unit 14 inserted in the terminal end of a power feed line 3 extending from a high frequency power oscillator 1 to a plasma...http://www.google.fr/patents/US5936481?utm_source=gb-gplus-shareBrevet US5936481 - System for impedance matching and power control for apparatus for high frequency plasma treatment
System for impedance matching and power control for apparatus for high ...
