An exposure apparatus for exposing an exposure member or wafer to a pattern with radiation in a step-and-repeat manner thereby to transfer images of the pattern onto different regions on a surface of the exposure member. The apparatus includes an XY stage for moving the wafer in X- and Y-directions,...http://www.google.fr/patents/US5150152?utm_source=gb-gplus-shareBrevet US5150152 - Exposure apparatus including device for determining movement of an object
Exposure apparatus including device for determining movement of an object
