The present invention relates to a micromininiaturization technique to achieve the miniaturization and higher integration of IC chip and to the improvement of a mask used in its manufacturing process. In other words, the phases of lights transmitted through the mask is controlled within one mask pattern....http://www.google.fr/patents/US7008736?utm_source=gb-gplus-shareBrevet US7008736 - Semiconductor integrated circuit device fabrication method using a mask having a phase shifting film covering region and an opening region
Semiconductor integrated circuit device fabrication method using a mask ...
