The heat treatment apparatus of the present invention comprises a chamber, a hot plate for supporting and heating a substrate in a chamber, a gas supply mechanism having a single or a plurality of gas blow-out ports and arranged in an upper space above the hot plate in the chamber, for supplying a gas...http://www.google.fr/patents/US6291800?utm_source=gb-gplus-shareBrevet US6291800 - Heat treatment apparatus and substrate processing system
Heat treatment apparatus and substrate processing system
