A method of in-situ cleaning and deposition of device structures in a high density plasma environment. A device structure is located in a reaction chamber containing a sputter target. A high density plasma containing ionized gas particles is generated. The ionized gas particles are accelerated toward...http://www.google.fr/patents/US6346177?utm_source=gb-gplus-shareBrevet US6346177 - Method of in-situ cleaning and deposition of device structures in a high density plasma environment
Method of in-situ cleaning and deposition of device structures in a high ...
