A method of detecting deficiency of an aperture used in a charged-particle-beam exposure process employing at least two exposure columns is disclosed, where each of the two exposure columns passes a charged-particle beam through the aperture formed through a mask to shape a cross section of the charged-particle...http://www.google.fr/patents/US6222195?utm_source=gb-gplus-shareBrevet US6222195 - Charged-particle-beam exposure device and charged-particle-beam exposure method
Charged-particle-beam exposure device and charged-particle-beam exposure method
