An apparatus and method for selectively removing undesired material from the surface of a substrate provides a flow of inert gas over the undesired material substrate surface while irradiating the undesired material with energetic photons. The invention enables removal of undesired material without altering...http://www.google.fr/patents/US6048588?utm_source=gb-gplus-shareBrevet US6048588 - Method for enhancing chemisorption of material
