Methods are provided for depositing amorphous carbon materials. In one aspect, the invention provides a method for processing a substrate including positioning the substrate in a processing chamber, introducing a processing gas into the processing chamber, wherein the processing gas comprises a carrier...http://www.google.fr/patents/US7407893?utm_source=gb-gplus-shareBrevet US7407893 - Liquid precursors for the CVD deposition of amorphous carbon films
Liquid precursors for the CVD deposition of amorphous carbon films
