A coupling grating formed as a line grating with a grating period between 100 nm and 2500 nm, a substrate (1) is covered with a photoresist layer (10) and exposed for instance at the Lithrow angle (ΘL) or at 0° to a mercury-vapour lamp (11) via a folding mirror (13, 13′) through a phase mask (14)...http://www.google.fr/patents/US6873764?utm_source=gb-gplus-shareBrevet US6873764 - METHOD FOR PRODUCING A GRID STRUCTURE, AN OPTICAL ELEMENT, AN EVANESCENCE FIELD SENSOR PLATE, MICROTITRE PLATE AND AN OPTICAL COMMUNICATION ENGINEERING COUPLER AS WELL AS A DEVICE FOR MONITORING A WAVELENGTH
METHOD FOR PRODUCING A GRID STRUCTURE, AN OPTICAL ELEMENT, AN EVANESCENCE ...
