An exhaust system for a semiconductor etcher that utilizes corrosive gas. Specifically, the present invention exhausts residual corrosive gas from the exit load lock compartment of a semiconductor etcher. For instance, at the completion of the etching process of semiconductor wafers, the exit load lock...http://www.google.fr/patents/US5900047?utm_source=gb-gplus-shareBrevet US5900047 - Exhaust system for a semiconductor etcher that utilizes corrosive gas
Exhaust system for a semiconductor etcher that utilizes corrosive gas
