The trench pattern of a dielectrically isolated island architecture is filled with doped polysilicon and used as an interconnect structure for circuit devices that are supported within the islands, thereby decreasing the amount of topside interconnect and reducing the potential for parasitics beneath...http://www.google.fr/patents/US5283461?utm_source=gb-gplus-shareBrevet US5283461 - Trench conductor and crossunder architecture
